Spectrum Process Equipment, Inc. - Plasmatherm SLR 770 (Inductively-Coupled Plasma (ICP) Etcher ***SOLD*** Equipment)

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Plasmatherm SLR 770 Inductively-Coupled Plasma (ICP) Etcher ***SOLD***

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Item Number	10087
Plasmatherm SLR Series 770 single chamber, loadlock, ICP etcher for processing wafers from 2-inches to 8-inches.
Chamber Style:	700-series style aluminum chamber, single chamber
Loadlock:	Yes
Electrodes:	11-inch electrode
RF Power Supply:	RFPP-RF5S RF power supply w/ AM5 matching network, RFPP-RF10M RF power supply w/ pase lock
Pressure Controller:	VAT PM5 pressure controller
Ion Controller:	Model 919 hot cathode ion controller
Pressure Controller:	VAT adaptive pressure controller
Turbo Pump:	Leybold 600C turbo pump
Chamber Pump:	Leybold D40BCS two-stage mechanical vacuum pump
Loadlock Pump:	Leybold D16B two-stage mechanical vacuum pump
Gas Configuration:	(6) MFC's present
Power Requirements:	208V / 60A / 3-phase

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