The ELAS (ESC Large Area Sputtering System) offers cassette to cassette operation for 4-inch, 6-inch and 8-inch wafers using an industry standard Brooks robot system.
ESC Large Area Sputtering System Features:
Chamber Cryo Pump:
CTI 10-inch cryo pump on chamber as standard
Loadlock Cryo Pump:
CTI 8-inch cryo, turbo pump or rotary pump available
DC Power Supply:
Advanced Energy Pinnacle DC Magnetron Power Supply
RF Power Supply:
RFPP RF20S Power Supply
Computer:
Techware II Ultra
Configuration:
3 targets plus RF etch station (as standard)
Loadlock:
Dual level load lock
Installation:
Bulkhead (through-wall) mounting for very small cleanroom footprint
