EV Group EVG101 Advanced Resist Spin Coating System
The EVG101 series performs R&D type processes on a single chamber design, which is fully compatible with EV Group automated systems. Besides all photo resists and polymers, The EVG101 Advanced Resist Spin Coating System supports specific processes such as wax coating or spin-on glass (SOG) coating and accepts small substrates, The EVG101 Spin Coater is a flexible tool for compound semiconductor and MEMS applications.
Karl Suss Mask Aligners are regarded as the benchmark in semiconductor submicron research and 3D micro-system production. These innovative systems meet customer's needs for precision and reliability.
This versatile SUSS MA4 is available with bottom-side-alignment microscopes (optical) for accurate backside processes. Optical bottom-side-alignment (BSA) has become an important feature, especially in Microsystem Technology.
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