The UV-Ozone cleaning process provides a simple, inexpensive, and fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic substances, such as quartz, silicon, gold, nickel, aluminum, gallium arsenide, alumina, etc. The process is ideal when thin film deposition with excellent adhesion to the substrate is required. Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques.
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